Laboratory testing services

Imaging of the sample using a scanning electron microscope (SEM) with energy-dispersive X-ray spectroscopy (EDX or EDS). In a typical measurement, several images are taken with varying magnifications to get a good overall view of the sample surface. Read more

Time-of-flight elastic recoil detection analysis (ToF-ERDA) can be used to measure thin films. It can provide the elemental composition of the material and can be used for depth profiling. Tof-ERDA is capable of detecting all elements and distinguishing between … Read more

X-ray reflectometry (XRR) analysis of thin film samples. Results include density (g/cm³), thickness (nm), and roughness (nm) values. For film thickness measurements, the thickness should generally be below 100 nm and at least one order of magnitude larger than the … Read more

Grazing Incidence X-ray diffraction (GI-XRD) measurement of thin film samples. Read more

In this analysis, the surface roughness value (RMS) of the sample is determined with atomic force microscopy (AFM). The price includes three measurement points from the sample. The measurement area is 5 x 5 micrometers, if not agreed otherwise. In … Read more

Cross-sectional high-resolution TEM-EDX with focused ion beam (FIB) preparation is a powerful combination of sample preparation and imaging techniques. A cross-section of the sample is prepared with a … Read more

The sample cross-section is prepared with a focused ion beam (FIB) and then imaged with a high-resolution transmission electron microscope (HR-TEM). The resulting image resolution is very high, … Read more

Imaging of the sample with transmission electron microscope (TEM). In typical measurement, several images with varying magnifications are taken to get a good overall view of the sample. Read more

XPS depth profiling is the alternating between ion gun etching cycles and XPS analysis cycles. The technique provides semi-quantitative information on the elemental composition (at.%) as a function of depth. The … Read more

Imaging of the sample with transmission electron microscope (TEM) and determination of the elemental composition of the sample using electron dispersive X-ray spectroscopy (EDX). In typical measurement, several images with varying magnifications are taken to get a good … Read more

XPS is a semi-quantitative technique allowing to measure the elemental composition of the surface of materials. In addition, it can also determine the binding and electronic state of the atoms. XPS is a surface-sensitive technique. Typical … Read more

Ellipsometry is an optical technique that characterizes polarized light reflected from a sample's surface. The thickness or the refractive index of the layer can be measured with this technique. This ellipsometry measurement is used to characterize thin films … Read more

During this analysis, the surface of a smooth and hard sample is imaged with an atomic force microscope (AFM). Topological images are provided from several locations around the sample. The measurement area is 5 x 5 micrometers, if not agreed otherwise. Read more

The analysis includes the preparation of a cross-section sample using a Focused Ion Beam (FIB) and the imaging of the cross-section surface with a Scanning Electron Microscope (SEM). Read more

A cross-section sample is prepared using freeze fracturing: the sample is frozen in liquid nitrogen (-195 C°), followed by cracking. The cracked surface is then imaged with a scanning electron microscope (SEM). … Read more

Nano Scratch Test of thin film samples. Typical measurement includes overview image of the scratch track (surface damage) and determination of critical load values. Read more

Determination of the elemental composition (ratio of the elements) using RBS (Rutherford Backscattering Spectrometry). Also, depth profiles of the sample surfaces can be determined using RBS. The method is suitable for e.g. thin films, coatings, … Read more

Determination of the elemental composition (ratio of the elements) using RBS (Rutherford Backscattering Spectrometry). Also, depth profiles of the sample surfaces can be determined using RBS. The method is suitable for e.g. thin films, coatings, and … Read more

Secondary ion mass spectrometry (SIMS) is a depth profiling method that can be used for a wide variety of solid materials to determine impurities or dopants. All elements from hydrogen to uranium can be detected. Standards are needed to get … Read more

VPD ICP-MS allows the determination of trace metal contamination on the surface of bare silicon wafers and thin films. The full surface of the wafer is scanned during the analysis. VPD ICP-MS analysis is performed using acid to dissolve the top surface of the wafer. The standard … Read more

XPS is a semi-quantitative technique allowing to measure the elemental composition of the surface of materials. In addition, it can also determine the binding state of the atoms. If you wish to perform this test, please ask the … Read more

Determination of B and P in Borophosphosilicate glass. Read more

The analysis includes the preparation of a cross-section sample using Broad Ion Beam (BIB). After preparation, the cross-section is imaged with a scanning electron microscope (SEM), and elemental … Read more

Determination of metal concentrations on ALD thin films using LA-ICP-MS. The measurement includes the analysis of the following elements: Ag, Al, As, Au, B, Ba, Be, Bi, Br, Ca, Cd, Ce, Co, Cr, Cs, Cu, Dy, Er, Eu Fe, Ga, Gd, Ge, Hf, … Read more

Measurement of roughness or edge sharpness by optical profilometry. Read more

Glow Discharge Optical Emission Spectroscopy (GD-OES) is a quantitative technique used to profile the elemental composition of a sample in depth. It is mainly used for quick depth profiling of thick materials, thus providing their elemental composition as a depth profile. It is commonly … Read more

Determination of a metal concentration on an ALD thin film using LA-ICP-MS. The measurement includes the analysis of one element, which is selected upon odering. Values will be reported in ppm (μg/g). Read more

Determination of metal concentrations on ALD thin films using LA-ICP-MS. The standard analysis package includes the quantification of the following elements: Ca, Cr, Cu, Co, Er, Fe, Ge, Pb, Mn, Mo, Ni, K, Na, Sn, Ti, Ta, Zn, … Read more

Magnetometry provides information on the magnetic properties of the sample material as a function of the magnetic field. A vibrating-sample magnetometer (VSM), also referred to as a Foner magnetometer, is used in the … Read more

It is a non-destructive technique in which picosecond acoustic pulses penetrate into thin films or nanostructures to reveal internal features such as film thickness as well as cracks, delaminations, and voids. Read more

Total reflection X-ray fluorescence (TXRF) allows for surface elemental composition measurement. It is often used to map trace contaminations. Detection limit: 109 – 1011 at/cm2 Depth resolution: about 3-9 nm (depending on the material) Read more

Grazing Incidence X-ray diffraction (GI-XRD) measurement of thin films + X-ray reflectometry (XRR) analysis of thin films. Results include density (g/cm³), thickness (nm), and roughness (nm) values. For XRR, the thickness should generally be below 100 nm and … Read more