Testing services / TXRF measurement

TXRF measurement

Total reflection X-ray fluorescence (TXRF) allows for surface elemental composition measurement.

It is often used to map trace contaminations.

Detection limit: 109 – 1011 at/cm2

Depth resolution: about 3-9 nm (depending on the material)

More information about the method family:

TXRF analysis
Suitable sample matrices
Si wafer or films
Required sample quantity
Full wafer up to 300mm
Typical turnaround time
3 weeks after receiving the samples
Available quality systems
Measurlabs validated method
Device types
TXRF
Method expert
Charlotte Zborowski
Charlotte Zborowski
SemiconductorsSemiconductorsCompositional analysisCompositional analysis

Questions? We're happy to help.

Questions? We're happy to help.

Business hours: Mon–Fri 9 AM – 5 PM Finnish time (EST/EEST)

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Have questions or need help? Email us at or call +358 50 336 6128.