TXRF measurement

Total reflection X-ray fluorescence (TXRF) allows for surface elemental composition measurement.

It is often used to map trace contaminations.

Detection limit: 109 – 1011 at/cm2

Depth resolution: about 3-9 nm (depending on the material)

Suitable sample matrices
Si wafer or films
Required sample quantity
Full wafer up to 300mm
Typical turnaround time
3 weeks after receiving the samples
Available quality systems
Measurlabs validated method
Device types

Questions? We're happy to help.

Questions? We're happy to help.

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