TXRF measurement
Total reflection X-ray fluorescence (TXRF) allows for surface elemental composition measurement.
It is often used to map trace contaminations.
Detection limit: 109 – 1011 at/cm2
Depth resolution: about 3-9 nm (depending on the material)
More information about the method family:
TXRF Analysis- Suitable sample matrices
- Si wafer or films
- Minimum sample amount
- Full wafer up to 300mm
- Typical turnaround time
- 3 weeks after receiving the samples
- Quality system
- Accredited testing laboratory
- Device types
- Method expert
![Charlotte Zborowski]()
Charlotte Zborowski
Semiconductors
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