X-ray photoelectron spectroscopy (XPS) depth profiling
XPS depth profiling is the alternating between ion gun etching cycles and XPS analysis cycles.
The technique provides semi-quantitative information on the elemental composition (at.%) as a function of depth. The binding and electronic states of atoms can also be analyzed as a function of depth.
XPS depth profiling is a destructive technique with an analysis area diameter ranging from 10 µm to several 100 µm.
More information about the method:
X-ray photoelectron spectroscopy (XPS)- Suitable sample matrices
- Thin films, coatings, films, stack, bulk materials
- Typical turnaround time
- 4 weeks after receiving the samples
- Detection limit
- 0.1 - 1 at.%
- Available quality systems
- Accredited testing laboratory
- Device types
- Method expert
Chemicals
Semiconductors
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