X-ray photoelectron spectroscopy (XPS)
XPS is a semi-quantitative technique to measure the elemental composition of the surface of a material. In addition, it can also determine the binding states of the elements. Typical analyzing depth is 5-10 nm and detection limits roughly 0.1-1 atomic %. XPS can determine all elements, except hydrogen (H) and He (helium).
More information about the method family:
X-ray photoelectron spectroscopy (XPS)
Semiconductors
Surface testing- Suitable sample matrices
- Solid
- Typical turnaround time
- 4 weeks after receiving the samples
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