Secondary ion mass spectrometry (SIMS)
Secondary ion mass spectrometry (SIMS) is a depth profiling method that can be used for a wide variety of solid materials to determine impurities or dopants.
All elements from hydrogen to uranium can be detected.
Standards are needed to get quantitative results.
More information about the method family:
Secondary ion mass spectrometry (SIMS)- Suitable sample matrices
- Solids, thin films, bulk materials
- Minimum sample amount
- 1x1 cm
- Typical turnaround time
- 3 weeks after receiving the samples
- Detection limit
- Down to ppm - ppb
- Quality system
- Measurlabs validated method
- Device types
- Method expert
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Charlotte Zborowski
Semiconductors
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