Secondary ion mass spectrometry (SIMS)

Secondary ion mass spectrometry (SIMS) is a depth profiling method that can be used for a wide variety of solid materials to determine impurities or dopants.

All elements from hydrogen to uranium can be detected.

Standards are needed to get quantitative results.

Suitable sample matrices
Solids, thin films, bulk materials
Required sample quantity
1x1 cm
Typical turnaround time
3 weeks after receiving the samples
Detection limit
Down to ppm - ppb
Available quality systems
Measurlabs validated method
Device types

Questions? We're happy to help.

Questions? We're happy to help.

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