Ellipsometry is an optical technique that characterizes polarized light reflected from a sample's surface.
The thickness or the refractive index of the layer can be measured with this technique.
This ellipsometry measurement is used to characterize thin films and bulk materials. The sample can be a single or multi-layer film with a preferred thickness between 1 nm and 1000 nm (or 1μm).
More information about the method family:Ellipsometry
- Suitable sample matrices
- Transparent and semitransparent samples, thin films, semiconductors, dielectrics, polymers, organic coatings, metal layers
- Typical turnaround time
- 2 weeks after receiving the samples
- Quality system
- Measurlabs validated method
- Device types