LA-ICP-MS of thin film samples (standard elements)
Determination of metal concentration on ALD thin films using LA-ICP-MS. Standard analyses includes analysis of following elements: Ca, Cr, Cu, Co, Er, Fe, Ge, Pb, Mn, Mo, Ni, K, Na, Sn, Ti, Ta, Zn, Bi, Au, Sn, V, Sr ja Y. Values will be reported in ppm (μg / g).
More information about the method family:
LA-ICP-MS Analysis (LA-ICP-MS)
Semiconductors
Elements and ions
Surface testing- Suitable sample matrices
- Thin film, ALD samples
- Typical turnaround time
- 4 weeks after receiving the samples
- Quality system
- Accredited testing laboratory
- Device families
- Method expert
Questions? We're happy to help.
Questions? We're happy to help.
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