XRR of thin films or coatings

X-Ray Reflectometry (XRR) analysis is used to measure the density (g/cm³), thickness (nm), and roughness (nm) of thin films.

The method is applicable for the characterization of single or multilayered thin films as it provides information on the thickness and density of individual layers of the sample material as well as the roughness of the interphases.

Greatest accuracy for thickness measurements is achieved for samples that contain a film or film stack with a combined thickness of 300 nm or less and low surface roughness (<5 nm). Thicker films and coatings (up to ~5 µm) with rougher surfaces can also be characterized but, the accuracy of thickness determination decreases as the thickness and roughness of the film or film stack increases.

>150 mm wafers are typically cut to fit the sample holder.

Please contact our experts if you want to buy XRR measurements need further information on the analysis or have >150mm wafers that cannot be cut to pieces.

Example of XRR results