XRR of thin films or coatings

X-Ray Reflectometry (XRR) analysis is used to measure the density (g/cm³), thickness (nm), and roughness (nm) of thin films.

The method is applicable to the characterization of single- or multilayered thin films, as it provides information on the thickness and density of individual layers of the sample material as well as the roughness of the interphases.

Greatest accuracy for XRR thickness measurements is generally achieved for samples containing 1-150 nm thick surface layers with under 5 nm RMS roughness. Thicker films and coatings with rougher surfaces can also be characterized but, the accuracy of thickness determination decreases as the thickness and roughness of the film or film stack increases.

>150 mm wafers are typically cut to fit the sample holder.

The available temperature range for XRR measurements is 25-1100 °C and the crystallinity can be studied as a function of temperatures. The measurements can be done under a normal atmosphere, inert gas, or vacuum.

Please contact our experts if you want to buy XRR measurements, need further information on the analysis, or have >150mm wafers that cannot be cut to pieces.