LA-ICP-MS of thin film samples (one element)
Determination of metal concentration on ALD thin films using LA-ICP-MS. Measurement includes analysis of one element. Values will be reported in ppm (μg / g).
More information about the method family:
ICP-MS Analysis (ICP-MS)
Semiconductors
Elements and ions
Surface testing- Suitable sample matrices
- Thin films, ALD samples
- Typical turnaround time
- 3 weeks after receiving the samples
- Quality system
- Accredited testing laboratory
- Device families
- Method expert
Questions? We're happy to help.
Questions? We're happy to help.
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