Testing services / LA-ICP-MS of thin film samples (one element)

LA-ICP-MS of thin film samples (one element)

Determination of a metal concentration on an ALD thin film using LA-ICP-MS. The measurement includes the analysis of one element, which is selected upon odering.

Values will be reported in ppm (μg/g).

More information about the method:

LA-ICP-MS analysis (LA-ICP-MS)
Suitable sample matrices
Thin films, ALD samples
Typical turnaround time
3 weeks after receiving the samples
Available quality systems
Accredited testing laboratory
Device types
LA-ICP-MS
Method expert
Hande Güneş
Hande Güneş
SemiconductorsSemiconductorsElements and ionsElements and ionsSurface testingSurface testing

Questions? We're happy to help.

Questions? We're happy to help.

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