GI-XRD of thin films
Grazing incidence X-ray diffraction (GI-XRD) measurement for thin films and surface layers.
The measurement provides the following information:
XRD spectrum and identification of the phase(s)
Crystallinity, crystallite size, lattice parameters, and strain of the phase. NOTE that these parameters are determined if the samples are highly crystalline. It may not be possible to determine them if the crystallinity is insufficient.
Best GI-XRD results are typically achieved for samples containing up to 300 nm thick surface layers with under 10 nm RMS roughness. Thicker films and coatings with rougher surfaces can also be characterized, but the quality of the data is generally lower for rough samples, and the sample properties below 300 nm depths are typically not reflected in the results.
One of the following instruments is typically used to perform the measurements:
Rigaku SmartLab
Panalytical X'Pert Pro MPD
Bruker D8 Discover
Malvern Empyrean
By default, the GI-XRD is conducted in ambient conditions, but temperatures of 25 to 1100 °C can be used to study crystallinity as a function of temperature. The measurements can also be performed under inert gas or vacuum if needed. Please contact our experts to discuss the available temperature and atmosphere combinations.
More information about the method:
Grazing incidence X-ray diffraction (GIXRD)- Suitable sample matrices
- Thin films (metal oxides, nitrides, metals, etc.) on typical substrates, such as silicon (Si), gallium nitride (GaN), silicon carbide (SiC), gallium arsenide (GaAs) or indium phosphide (InP).
- Required sample quantity
- Optimal size: 5 x 4 cm, minimum: 2 x 2 cm
- Typical turnaround time
- 2 weeks after receiving the samples
- Available quality systems
- Measurlabs validated method
- Device types
- Method expert
Price
We also charge a 97 € service fee per order.
Large batches of samples are eligible for discounts.
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