GI-XRD of thin films

Grazing Incidence X-ray diffraction (GI-XRD) measurement for determination of crystallographic structures, phases, and lattice parameters of crystalline thin films and surface layers.

Typical Use Cases

• Thin film characterization in semiconductors and photovoltaics

• Analysis of coatings, multilayers, and nanostructures

• Studying phase transitions and surface modifications

Suitable Samples

• Thin films (few nanometers to micrometers)

• Coatings and multilayers on substrates like silicon or glass.

Limitations

• Gives detailed information only for crystalline phases (can be used to demonstrate amorphicity though)

• Requires smooth, uniform surfaces