GI-XRD of thin films

Grazing Incidence X-ray diffraction (GI-XRD) measurement for thin films and surface layers.

The measurement provides the following information:

  • XRD spectrum and identification of the phase(s)

  • Crystallinity, crystallite size, lattice paraments, and strain of the phase. NOTE. these parameters are determined if the samples are highly crystalline. Not always possible to determine if the crystallinity is insufficient.

Best GI-XRD results are typically achieved for samples containing up to 300 nm thick surface layers with under 10 nm RMS roughness. Thicker films and coatings with rougher surfaces can also be characterized but, the quality of the data is generally lower for rough samples and the sample properties below 300 nm depths are typically not reflected in the results.

By default, the GI-XRD measurements are conducted in ambient conditions, but temperatures of 25-1100 °C can be used and the crystallinity can be studied as a function of temperatures. The measurements can also be done under inert gas or vacuum if needed. Please contact our experts to discuss the available temperature and atmosphere combinations.

Suitable sample matrices
Thin films (metal oxides, nitrides, metals, etc.) on typical substrates, such as silicon (Si), gallium nitride (GaN), silicon carbide (SiC), gallium arsenide (GaAs) or indium phosphide (InP).
Required sample quantity
Optimal size: 5 x 4 cm, minimum: 2 x 2 cm
Typical turnaround time
2 weeks after receiving the samples
Available quality systems
Measurlabs validated method
Device types

Questions? We're happy to help.

Questions? We're happy to help.

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