Broad Ion Beam (BIB) sample preparation

Broad Ion Beam (BIB) sample preparation enables the creation of surfaces or cross-sections that are ideal for imaging with scanning electron microscopy (SEM). This method utilizes a focused, high-energy ion beam to etch or mill the sample material with precision, ensuring minimal damage to the surface structure.

Typical use cases

• Preparation of cross-sections for SEM to analyze thin films, coatings, and layered structures.

• Preparation of samples for SEM imaging of defects, grain boundaries, or interfaces in advanced materials.

Suitable Samples

• Thin films deposited on various substrates, such as Si wafers, with thicknesses ranging from a few dozen nanometers to several micrometers.

• Bulk materials, including metals, ceramics, polymers, and composites.

• Samples requiring precise structural analysis without introducing thermal or mechanical damage.

Limitations

• Not suitable for materials with extreme sensitivity to ion bombardment.

• Limited applicability for very large samples due to equipment constraints.

• Potential for slight ion-induced alterations in ultra-sensitive materials.

Related Techniques

• For for site-specific thinning or preparation of samples for Tramismission Electon Microscopy (TEM), Focused Ion Beam (FIB) sample prepaparation is used.

• Freeze Fracturing can often be used for thin organic samples instead of BIB to save money.