Testing services / TXRF measurement

TXRF measurement

Total reflection X-ray fluorescence (TXRF) allows for surface elemental composition measurement.

It is often used to map trace contaminations.

Detection limit: 109 – 1011 at/cm2

Depth resolution: < 10 nm

More information about the method:

TXRF analysis
Suitable sample matrices
Si wafer or films
Required sample quantity
Full wafer up to 300mm
Typical turnaround time
2 – 3 weeks after receiving the samples
Available quality systems
Measurlabs validated method
Device types
TXRF
Method expert
Kamal Mundoli
Kamal Mundoli
SemiconductorsSemiconductorsCompositional analysisCompositional analysis

Questions? We're happy to help.

Questions? We're happy to help.

Business hours: Mon–Fri 9 AM – 5 PM Finnish time (EST/EEST)

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