SIMS measurement
Secondary ion mass spectrometry (SIMS) is a highly sensitive elemental depth profiling method that can be used for a wide variety of solids to determine the presence of impurities or concentration of dopants.
All elements from hydrogen to uranium can be detected with concentrations in the parts-per-billion (ppb) range. By using standards, SIMS allows for both qualitative and quantitative analysis.
Depth profiling can be done from 10 nm down to a few µm thickness and needs to be done in electronegative or electropositive modes, depending on the analyzed elements.
Do not hesitate to contact our expert for a quote tailored to your analysis project.
More information about the method:
SIMS analysis- Suitable sample matrices
- Solids, thin films, bulk materials
- Required sample quantity
- 1x1 cm
- Typical turnaround time
- 2 – 3 weeks after receiving the samples
- Detection limit
- Down to ppm - ppb
- Available quality systems
- Measurlabs validated method
- Device types
- Method expert
Price
We also charge a 97 € service fee per order.
Large batches of samples are eligible for discounts.
Questions? We're happy to help.
Questions? We're happy to help.
Business hours: Mon–Fri 9 AM – 5 PM Finnish time (EST/EEST)
Other tests we offer
Ultrapure water testing
RBS measurement
X-ray photoelectron spectroscopy (XPS)
TXRF measurement
High-resolution mass spectrometry (HRMS)
ToF-ERDA measurement
AES measurement
X-ray photoelectron spectroscopy (XPS) depth profiling
GD-OES measurement
XRR of thin films or coatings
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