ICP-MS for thin films on wafers
Determination of trace metal contamination in thin films on silicon wafers. Different methods can be used depending on the material and substrate.
Please, contact our expert to discuss the feasibility of the measurement for your matrix.
More information about the method family:
ICP-MS Analysis (ICP-MS)- Suitable sample matrices
- Thin film or coating on wafer
- Required sample quantity
- 1 full wafer
- Typical turnaround time
- 2 weeks after receiving the samples
- Detection limit
- Ppm - ppb
- Available quality systems
- Accredited testing laboratory
- Device types
- Method expert
Semiconductors
Compositional analysis
Surface testingQuestions? We're happy to help.
Questions? We're happy to help.
Ask for an offer
Fill in the form, and we'll reply in one business day.
Have questions or need help? Email us at info@measurlabs.com or call +358 50 336 6128.