ICP-MS for thin films on wafers

Determination of trace metal contamination in thin films on silicon wafers. Different methods can be used depending on the material and substrate.

We have package analysis for a wide range of elements and can also provide analysis for noble metals.

Elements such as H, C, N, O, or F cannot be analyzed by the ICP-MS method.

Please, contact our expert to discuss the feasibility of the measurement for your matrix and the elements packages we can provide.

Suitable sample matrices
Thin film or coating on wafer
Required sample quantity
1 full wafer
Typical turnaround time
2 weeks after receiving the samples
Detection limit
Ppm - ppb
Available quality systems
Accredited testing laboratory
Device types

Questions? We're happy to help.

Questions? We're happy to help.

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  • How many samples do you have and what is the sample material?
  • Do you have a recurring need for these tests? If yes, how often and for how many samples at a time?

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